EUV photomask inspection and management engineering at Micron Technology

, , Japan -

Full Time

Start Date

Immediate

Expiry Date

22 Aug, 26

Salary

0.0

Posted On

24 May, 26

Experience

2 year(s) or above

Remote Job

Yes

Telecommute

Yes

Sponsor Visa

Skills

EUV Photomask Management, Lithography, 8D Problem Analysis, Contamination Control, Defect Reduction, SQL, RPA, Excel Automation, Quality Management, Process Optimization, Technical Investigation, English Communication, Data-Driven Problem Solving, Project Management, Cross-functional Collaboration, Presentation Skills

Industry

Semiconductor Manufacturing

Description

Our vision is to transform how the world uses information to enrich life for all. Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. F15 ATE（Alpha Technology Engineering）Photo エンジニアは、研究開発チームから移管される新技術の量産導入、良品率（Yield）の向上、サイクルタイム短縮を推進し、関連するすべての部門および DRAM ネットワークと連携しながら成果を創出する役割を担います。また、ATE Photo EUV フォトマスクエンジニアとして、最先端リソグラフィ工程で使用される EUV フォトマスクの品質・信頼性・運用健全性を確保する専門エンジニアリングチームの一員として活動します。プロセスエンジニア、スキャナー装置エンジニア、その他の関係パートナーと密に連携し、フォトマスク認定、コンタミネーション管理、欠陥低減など、EUV パターニング性能に直結する重要業務を主導します。この役割は、広島サイト（Fab15）における EUV プロセスの安定稼働に不可欠であり、技術調査・改善、データドリブンアプローチ、業務効率化を通じて、EUV フォトマスクに関連するリスクをプロアクティブに管理することが求められます。 The F15 ATE (Alpha Technology Engineering) Photo Engineer plays a key role in driving the successful transfer of new technologies from the R&D organization into high‑volume manufacturing, improving yield performance, shortening cycle time, and delivering measurable results through collaboration with all relevant departments and the global DRAM network. As an ATE Photo EUV Photomask Engineer, you will be part of a specialized engineering team dedicated to ensuring the quality, reliability, and operational integrity of EUV photomasks used in advanced lithography processes. You will closely collaborate with process engineers, scanner equipment engineers, and other cross‑functional partners to lead critical activities such as photomask qualification, contamination control, and defect reduction—tasks that directly influence EUV patterning performance. This role is essential for maintaining stable EUV operations at Micron’s Hiroshima Fab (Fab15). You will be responsible for proactively managing photomask‑related risks—one of the most critical factors in EUV processing—through technical investigation, continuous improvement, data‑driven problem solving, and operational efficiency enhancement. ■ 職務内容生産ファブにおける EUV フォトマスク管理および関連技術に関するビジネスプロセスの構築・改善・最適化プロセス能力向上および生産コスト削減の推進プロセスマネジメントプロジェクトの立案およびリード各種フォトマスク関連装置のプロセスパラメータ設定・評価新規装置・新規材料の評価、導入推進、技術ロードマップ策定異常発生時の 8D 問題解析の実施 ■ 要件論理的思考に基づく実行力の高い問題解決能力プロセス改善に向けた新しいアイデアを創出できる能力各タスクの進捗を正確かつタイムリーに報告できる能力デジタルスキル（Excel、SQL、RPA などを活用した業務効率化スキル）チームメンバー、関係部門、DRAM ネットワークパートナーと良好な協働関係を構築できる能力優れたコミュニケーション力およびプレゼンテーションスキルビジネスレベルの英語での会話・文書作成能力品質管理の理解と、主体的な品質改善活動を推進できる能力 ■ Responsibilities and Tasks Establish, improve, and optimize business processes related to in‑fab EUV photomask management and technologies Drive process capability enhancement and production cost reduction Plan and lead process management projects Define and evaluate process parameters for various photomask‑related equipment Evaluate, promote, and implement new equipment and materials; develop technology roadmaps Perform 8D root‑cause analysis for issues and abnormalities ■ Required Skills and Qualifications Strong problem‑solving capability grounded in logical and structured thinking Ability to generate innovative ideas for process improvement Ability to report task progress accurately and in a timely manner Digital skills such as Excel automation, SQL data handling, and RPA‑driven workflow optimization Strong collaboration skills with team members, partner departments, and global DRAM network stakeholders Excellent communication and presentation skills Business‑level proficiency in English (verbal and written) Solid understanding of quality management and ability to lead proactive quality improvement initiatives About Micron Technology, Inc. We are an industry leader in innovative memory and storage solutions transforming how the world uses information to enrich life for all. With a relentless focus on our customers, technology leadership, and manufacturing and operational excellence, Micron delivers a rich portfolio of high-performance DRAM, NAND, and NOR memory and storage products through our Micron® and Crucial® brands. Every day, the innovations that our people create fuel the data economy, enabling advances in artificial intelligence and 5G applications that unleash opportunities — from the data center to the intelligent edge and across the client and mobile user experience. To learn more, please visit micron.com/careers All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, veteran or disability status. To request assistance with the application process and/or for reasonable accommodations, please contact hrsupport_japan@micron.com Micron Prohibits the use of child labor and complies with all applicable laws, rules, regulations, and other international and industry labor standards. Micron does not charge candidates any recruitment fees or unlawfully collect any other payment from candidates as consideration for their employment with Micron. AI alert: Candidates are encouraged to use AI tools to enhance their resume and/or application materials. However, all information provided must be accurate and reflect the candidate's true skills and experiences. Misuse of AI to fabricate or misrepresent qualifications will result in immediate disqualification. Fraud alert: Micron advises job seekers to be cautious of unsolicited job offers and to verify the authenticity of any communication claiming to be from Micron by checking the official Micron careers website in the About Micron Technology, Inc.

Responsibilities

Lead the quality, reliability, and operational integrity of EUV photomasks to ensure stable patterning performance at the Hiroshima Fab. Establish and optimize business processes for photomask management while driving cost reduction and process capability enhancements.