Intern - PD SG Diffusion/Implant at Micron Technology

, , Singapore -

Full Time

Start Date

Immediate

Expiry Date

11 Mar, 26

Salary

0.0

Posted On

11 Dec, 25

Experience

0 year(s) or above

Remote Job

Yes

Telecommute

Yes

Sponsor Visa

Skills

Materials Chemistry, Silicon Oxides, Metal Oxides Dielectrics, Solid State Transistor Physics, Characterization Techniques, SEM, TEM, XRD, Photoluminescence, Material Science, Nanomaterials, Chemical Engineering, Chemistry, Physics, Physical Chemistry, Transistor Physics

Industry

Semiconductor Manufacturing

Description

Our vision is to transform how the world uses information to enrich life for all. Join an inclusive team passionate about one thing: using their expertise in the relentless pursuit of innovation for customers and partners. The solutions we build help make everything from virtual reality experiences to breakthroughs in neural networks possible. We do it all while committing to integrity, sustainability, and giving back to our communities. Because doing so can fuel the very innovation we are pursuing. Location: Fab10N Singapore Department: Process Development - Singapore (Diffusion/Implant) Project title: NAND cell films variation reduction Project Description: Quantify and set targets for Tech Node cell films variation Project scope: Candidate will be able to learn about key cell films deposition and treatment processes building deeper understanding on NAND memory cell function Deliverable: Define and runs evaluations to close the gaps for top 3 films variation metrics Skillset required: Only for PhD candidates Materials chemistry (Silicon oxides and metal oxides dielectrics), solid state transistor physics. Characterization techniques: SEM, TEM, XRD, Photoluminescence Course of interest: Material science, nanomaterials, chemical engineering, chemistry, physics department ,physical chemistry, transistor physics. Duration period: 4-6 months (minimum 4 months for full time internship) About Micron Technology, Inc. We are an industry leader in innovative memory and storage solutions transforming how the world uses information to enrich life for all. With a relentless focus on our customers, technology leadership, and manufacturing and operational excellence, Micron delivers a rich portfolio of high-performance DRAM, NAND, and NOR memory and storage products through our Micron® and Crucial® brands. Every day, the innovations that our people create fuel the data economy, enabling advances in artificial intelligence and 5G applications that unleash opportunities — from the data center to the intelligent edge and across the client and mobile user experience. To learn more, please visit micron.com/careers All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, veteran or disability status. To request assistance with the application process and/or for reasonable accommodations, please contact hrsupport_sg@micron.com Micron Prohibits the use of child labor and complies with all applicable laws, rules, regulations, and other international and industry labor standards. Micron does not charge candidates any recruitment fees or unlawfully collect any other payment from candidates as consideration for their employment with Micron. AI alert: Candidates are encouraged to use AI tools to enhance their resume and/or application materials. However, all information provided must be accurate and reflect the candidate's true skills and experiences. Misuse of AI to fabricate or misrepresent qualifications will result in immediate disqualification. Fraud alert: Micron advises job seekers to be cautious of unsolicited job offers and to verify the authenticity of any communication claiming to be from Micron by checking the official Micron careers website in the About Micron Technology, Inc.

Responsibilities

The candidate will quantify and set targets for Tech Node cell films variation and will learn about key cell films deposition and treatment processes. They will define and run evaluations to close the gaps for the top 3 films variation metrics.