Process Engineer 3
at Lam Research
Fremont, CA 94538, USA -
Start Date | Expiry Date | Salary | Posted On | Experience | Skills | Telecommute | Sponsor Visa |
---|---|---|---|---|---|---|---|
Immediate | 28 Apr, 2025 | USD 84000 Annual | 28 Jan, 2025 | 3 year(s) or above | Minitab,Reactive Ion Etching,Ale,Ccp,Materials Science,Chemistry,Plasma Physics,Rie,Surface Preparation,Design,Inductively Coupled Plasma,Atomic Layer Deposition,Python,Icp,Statistical Tools,Chemical Engineering,Matlab,Process Control,Jmp,Physics | No | No |
Required Visa Status:
Citizen | GC |
US Citizen | Student Visa |
H1B | CPT |
OPT | H4 Spouse of H1B |
GC Green Card |
Employment Type:
Full Time | Part Time |
Permanent | Independent - 1099 |
Contract – W2 | C2H Independent |
C2H W2 | Contract – Corp 2 Corp |
Contract to Hire – Corp 2 Corp |
Description:
THE GROUP YOU’LL BE A PART OF
The Office of the CTO is where innovation takes center stage. We inspire our global technical community to take on grand challenges, understand emerging trends, identify the critical inflections, and drive our sustainability, Environment, Social, and Governance (ESG) practices that will define the next generation of semiconductors and continued impact.
MINIMUM QUALIFICATIONS:
- Master’s degree in Materials Science, Chemical Engineering, Chemistry or Physics or related field with 3+ years of experience; or a PhD with no previous professional experience; or equivalent experience.
PREFERRED QUALIFICATIONS
- Familiarity with working in a laboratory and on semiconductor equipment with experience in surface preparation and analytical techniques.
- In-depth understanding of Statistical Process Control (SPC) and/or Design of Experiments (DOE).
- Highly proficient in MATLAB, Python, or other similar scientific computing language.
- Working knowledge of statistical analysis and problem-solving methodologies.
- Experience with statistical tools (JMP, Minitab, etc.)
- Background in Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Plasma Enhanced Chemical Vapor Deposition (PECVD), or Physical Vapor Deposition (PVD).
- Background in Plasma Physics, Reactive Ion Etching (RIE), Atomic Layer Etching (ALE), Inductively Coupled Plasma (ICP), Capacitively Coupled Plasma (CCP).
- Knowledge of Material synthesis and material characterization.
- Experience working in a collaborative and matrixed environment with diverse teams, semiconductor customers, and/or partners.
Responsibilities:
- Conduct process engineering research, development, and evaluation in support of Lam’s cutting-edge semiconductor equipment and systems.
- Review and enhance processing techniques and methods applied in the manufacture and fabrication of products.
- Develop and sustain new processes and process improvements to reduce production costs and increase yields.
- Compile and analyze test data to establish next steps in process development and determine appropriate limits and variables for process specifications.
- Collaborate internally to plan, collect data, analyze results, and report on customer demos for existing process applications.
- Contribute to next generation product development and release activities supporting the semiconductor roadmap.
- Provide leadership, clear direction, and guidance to process technicians to support execution activities.
REQUIREMENT SUMMARY
Min:3.0Max:8.0 year(s)
Information Technology/IT
Engineering Design / R&D
Software Engineering
Graduate
Chemical, Chemistry, Engineering
Proficient
1
Fremont, CA 94538, USA