SD-25156 – RESEARCHER IN ATMOSPHERIC PLASMA DEPOSITION OF THIN FILM FOR ADH at Luxembourg Institute of Science and Technology LIST
Esch-sur-Alzette, , Luxembourg -
Full Time


Start Date

Immediate

Expiry Date

28 Nov, 25

Salary

0.0

Posted On

29 Aug, 25

Experience

0 year(s) or above

Remote Job

Yes

Telecommute

Yes

Sponsor Visa

No

Skills

English, Thin Films, Adhesion, Chemical Engineering, Chemistry, French

Industry

Information Technology/IT

Description

EDUCATION

  • The candidate should have a PhD degree in Chemistry, Chemical Engineering, Materials Sciences or related fields.

EXPERIENCE AND SKILLS

  • Extensive experience in the Plasma Enhanced Chemical Vapor Deposition of functional thin films.
  • Good knowledge about Thin Film characterisation and Adhesion evaluation with state-of-the art methods.
  • Demonstrated experience in applied research and industrial projects.
  • Applicants are encouraged to add their three best publications to their application and a short narrative on their contribution for each.

LANGUAGE SKILLS

  • Fluency in English, both oral and written. French is considered to be an asset.
Responsibilities

Please refer the Job description for details

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