POSITION SUMMARY:

Inpria, a subsidiary of JSR Corporation, has an immediate opening for a Senior Staff Chemist based in Corvallis, OR. We seek an enthusiastic and conscientious candidate to join our diverse and talented R&D team as we extend the limits of EUV lithography. This lab-centric position carries responsibilities for design, formulation, coating, and analysis of cutting-edge metal-oxide photoresists; exploration of structure-property relationships and linking solution-based organic chemistry to wafer-based characterization to forge novel resist materials. In our collegial, science-focused R&D team, technical growth and skill development are a key part of our innovation culture. At Inpria, your aptitude for problem solving, strong chemistry fundamentals, and outstanding communication skills will help deliver cutting-edge materials to our customers, extend Moore’s law and provide excellent career growth opportunities in a dynamic global industry.

KEY QUALIFICATIONS:

• M.S. in chemistry, chemical engineering or relevant related discipline; PhD preferred
• Demonstrated record of achievement and innovation in an applied research setting in organic/polymer chemistry, organometallic synthesis or catalysis, materials science or other relevant field.
• Lab or Fab experience in advanced photolithography a plus.
• Active and effective verbal, written, and electronic communication and technical presentation skills.
• Self-motivated and proactive in achieving goals; able to thrive in a fast-paced team environment.
• Strong history of safe laboratory practice and active participation in laboratory and workplace safety programs.
• Ability to successfully complete a pre-employment drug test.

PHYSICAL REQUIREMENTS:

• Ability to sit or stand for long periods of time.
• Ability to use a keyboard and mouse for computer data entry and/or analysis, and for presenting data.
• Ability to wear standard PPE in areas that require it.
• Ability to use a glovebox with thick rubber gloves to manipulate Si wafers and smaller samples in an airtight environment.
• Ability to utilize equipment that operates in low-pressure and air-free conditions.
• Possibility of occasional overnight domestic or internation travel for meetings and/or conferences.

• Design and execute effective and efficient experiments to elucidate the link between lithographic observables and chemical properties.
• Identify and collect key chemical datasets by leveraging internal and external analytical capabilities.
• Collaborate with lithography and synthesis teams on resist design and performance evaluation.
• Perform NMR, KF, FTIR, TGA, ESI-MS, ellipsometry, and other measurements as part of integrated experiments.
• Engage with global customer teams to identify performance gaps and design & formulate high-performance MOx EUV photoresists to address customer needs.
• Perform other duties as assigned.