Senior / Staff Engineer - GaN Metrology at Infineon Technologies AG Australia
, , Singapore -
Full Time


Start Date

Immediate

Expiry Date

12 Feb, 26

Salary

0.0

Posted On

14 Nov, 25

Experience

5 year(s) or above

Remote Job

Yes

Telecommute

Yes

Sponsor Visa

No

Skills

GaN Metrology, Material Science, Chemistry, Solid State Physics, MOCVD, Hetero-epitaxy, Material Characterisation, Metrology Techniques, Data Organisation, Data Analysis, Communication Skills, Cross-functional Teams, AFM, TEM, XRD, Ellipsometry, FTIR

Industry

Semiconductor Manufacturing

Description
Development and optimisation of metrology techniques for GaN on Si &GaN on Sapphire material systems Performing assessments and tool matching to ensure measurement accuracy and consistency across different tools. Ph.D in Material Science (or) Masters in Material Science / Chemistry/ Solid State Physics with 3+ years of Industry experience (or) Undergraduate degree with 5+ years of Industry experience with focus on III-V Hetero-epitaxy MOCVD material characterisation Hands-on metrology experience (AFM/TEM/XRD/P/Ellipsometry/FTIR) with AlGaN/GaN HEMTs systems on Silicon and Sapphire Substrates (critical requirement) Good understanding of MOCVD based III-V Hetero-epitaxy processes and their impact on material characterisation Expertise in data organisation/data analysis Good communication skills and ability to work with cross-functional teams in a global R&D organisation We are on a journey to create the best Infineon for everyone. This means we embrace diversity and inclusion and welcome everyone for who they are. At Infineon, we offer a working environment characterized by trust, openness, respect and tolerance and are committed to give all applicants and employees equal opportunities. We base our recruiting decisions on the applicant´s experience and skills.

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Responsibilities
Develop and optimize metrology techniques for GaN on Si and GaN on Sapphire material systems. Perform assessments and tool matching to ensure measurement accuracy and consistency across different tools.
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