Development & Process Engineer for Electron Beam Lithography (m/f/d)

at  IMS Nanofabrication

Brunn, ST, Austria -

Start DateExpiry DateSalaryPosted OnExperienceSkillsTelecommuteSponsor Visa
Immediate31 Jan, 2025Not Specified01 Nov, 2024N/AMaterials Science,Physics,Teamwork,Materials Research,TrainingNoNo
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Description:

YOUR QUALIFICATIONS:

  • University degree in microsystems technology, physics, materials science or a related field
  • Sound technical knowledge of the scientific principles of materials science is an advantage
  • Practical skills in modern materials research (SEM, FIB, …) an advantage
  • High level of commitment to training and teamwork
  • Strong sense of precision and quality
  • Self-motivated and committed

Responsibilities:

YOUR RESPONSIBILITIES:

  • Continuous optimization of e-beam mask writing processes through modelling, process simulation and optimization of in-house mask development processes.
  • Development of photoresists for e-beam lithography with external partners
  • Preparation, documentation and evaluation of measurement recipes
  • Analytical investigations and failure analysis in CMOS/MEMS process technology
  • Operation of fully automated high precision measurement systems (electron beam, ion beam, light or mechanical based)
  • Equipment maintenance and uptime maximisation


REQUIREMENT SUMMARY

Min:N/AMax:5.0 year(s)

Information Technology/IT

IT Software - Other

Software Engineering

Graduate

Microsystems technology physics materials science or a related field

Proficient

1

Brunn, ST, Austria